Plasma and gas-phase characterization of a pulsed plasma-enhanced chemical vapor deposition system engineered for self-limiting growth of aluminum oxide thin films

Surface and Coatings Technology

Volumn 201, Issue 22-23 SPEC. ISS., 2007, Pages 8991-8997

  Szymanski, Scott F ^a   Seman, Michael T ^a   Wolden, Colin A ^a  

^a Department of Geology and Geological Engineering   (United States)

Author keywords

Aluminum Oxide; Glow discharge mass spectroscopy (GDMS); Glow discharge optical spectroscopy (GDOS); PACVD; Pulsed

Indexed keywords

EMISSION SPECTROSCOPY; GLOW DISCHARGES; GROWTH KINETICS; MASS SPECTROMETRY; METALLIC FILMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

ALUMINUM OXIDE THIN FILMS; GLOW DISCHARGE MASS SPECTROSCOPY; GLOW DISCHARGE OPTICAL SPECTROSCOPY; TRIMETHYL ALUMINUM (TMA);

ALUMINA;

ALUMINA; EMISSION SPECTROSCOPY; GLOW DISCHARGES; GROWTH KINETICS; MASS SPECTROMETRY; METALLIC FILMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 34547667473     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.04.076     Document Type: Article

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