Large-scale, high-efficiency thin-film silicon solar cells fabricated by short-pulsed plasma CVD method

Solar Energy Materials and Solar Cells

Volumn 90, Issue 18-19, 2006, Pages 3416-3421

  Fujioka, Y ^a   Shimizu, A ^a   Fukuda, H ^a   Oouchida, T ^a   Tachibana, S ^a   Tanamura, H ^a   Nomoto, K ^a   Okamoto, K ^a   Abe, M ^a  

^a SHARP CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; CRYSTALLIZATION; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON; THIN FILMS;

CONVERSION EFFICIENCY; FABRICATION TECHNOLOGY; INTRINSIC LAYERS; MICROCRYSTALLINE SILICON;

SILICON SOLAR CELLS;

EID: 33748495108     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2005.10.027     Document Type: Article

References (7)

1. Watanabe Y., et al. Appl. Phys. Lett. 53 (1988) 1263
2. Watanabe Y., et al. Appl. Phys. Lett. 57 (1990) 1616
3. K. Nomoto, et al., Short-pulse VHF plasma-enhanced CVD of high-deposition-rate a-Si:H films, in: Proceedings of the 14th European Photovoltaic Solar Energy Conference and Exhibition, 1997, pp. 1226-1230.
4. M. Matsutani, et al., Autumn JSAP (The Japan Society of Applied Physics) Annual Meeting, 2002.
5. K. Nomoto, et al., Jpn. J. Appl. Phys. L1372.
6. Meier J., et al. Appl. Phys. Lett. 65 (1994) 860
7. K. Yamamoto, et al., High efficiency thin film silicon solar cell and module, in: Proceedings of the 29th IEEE PVSC, 2002, pp. 1110-1114.