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Volumn 351, Issue 24-26, 2005, Pages 1987-1994

An investigation of the role of plasma conditions on the deposition rate of electrochromic vanadium oxide thin films

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROOPTICAL DEVICES; ENERGY GAP; PHYSICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; VANADIUM COMPOUNDS;

EID: 21344444401     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.05.016     Document Type: Article
Times cited : (20)

References (24)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.