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Volumn 351, Issue 24-26, 2005, Pages 1987-1994
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An investigation of the role of plasma conditions on the deposition rate of electrochromic vanadium oxide thin films
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTROOPTICAL DEVICES;
ENERGY GAP;
PHYSICAL VAPOR DEPOSITION;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
REFRACTIVE INDEX;
VANADIUM COMPOUNDS;
BAND GAP;
FILM THICKNESS;
REACTANTS;
VANADIUM OXIDE;
THIN FILMS;
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EID: 21344444401
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2005.05.016 Document Type: Article |
Times cited : (20)
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References (24)
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