UV absorptance of titanium dioxide thin films by plasma enhanced deposition from mixtures of oxygen and titanium-tetrakis-isopropoxide

Plasma Chemistry and Plasma Processing

Volumn 26, Issue 3, 2006, Pages 319-334

  Sonnenfeld, Axel ^a   Hauert, Roland ^b   Von Rohr, Philipp Rudolf ^a  

^a ETH ZURICH   (Switzerland)

^b SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

Plasma enhanced chemical vapour deposition (PECVD); Polymeric substrate; Titanium dioxide; UV absorption; XPS

Indexed keywords

ABSORPTION; CONCENTRATION (PROCESS); PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SPECTRUM ANALYZERS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM DENSITY; POLYMERIC SUBSTRATE; UV ABSORPTION;

TITANIUM DIOXIDE;

EID: 33646499693     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11090-006-9022-6     Document Type: Article

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