An investigation of annealing on the dielectric performance of TiO 2 thin films

Semiconductor Science and Technology

Volumn 21, Issue 12, 2006, Pages 1573-1579

  Yang, Wenli ^a   Marino, Joseph ^a   Monson, Alexander ^a   Wolden, Colin A ^a  

^a Department of Geology and Geological Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL STRUCTURE; DIELECTRIC PROPERTIES; ELECTRON TUNNELING; OPTIMIZATION; THIN FILMS; TITANIUM DIOXIDE;

FOWLER-NORDHEIM TUNNELING; FRENKEL-POOLE CONDUCTION; OPTIMIZED FILMS;

SEMICONDUCTING FILMS;

EID: 33846892773     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/21/12/012     Document Type: Article

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