Deposition rate in modulated radio-frequency silane plasmas

Applied Physics Letters

Volumn 76, Issue 15, 2000, Pages 2002-2004

  Biebericher, A C W ^a   Bezemer, J ^a   Van Der Weg, W F ^a   Goedheer, W J ^a,b  

^a UTRECHT UNIVERSITY   (Netherlands)

^b FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001018374     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.126235     Document Type: Article

References (9)

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