Progress in EUV photoresist technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6533, Issue , 2007, Pages

  Wallow, Thomas I ^a   Kim, Ryoung Han ^a   La Fontaine, Bruno ^a   Naulleau, Patrick P ^b   Anderson, Chris N ^c   Sandberg, Richard L ^d  

^a ADVANCED MICRO DEVICES   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

^d UNIVERSITY OF COLORADO   (United States)

Author keywords

Extreme ultraviolet; Lithography; Pattern collapse; Photoresist; Process; Resolution; Smoothing

Indexed keywords

DIFFUSION LENGTH; MASK ERROR FACTORS; PATTERN COLLAPSE;

CHARACTERIZATION; EXTREME ULTRAVIOLET LITHOGRAPHY; MASKS; OPTICAL RESOLVING POWER; OPTICAL TRANSFER FUNCTION;

PHOTORESISTS;

EID: 35649017569     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.737189     Document Type: Conference Paper

References (27)

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