Verification of point-spread-function-based modeling of an extreme-ultraviolet photoresist

Applied Optics

Volumn 43, Issue 4, 2004, Pages 788-792

  Naulleau, Patrick P ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MATHEMATICAL MODELS; MIRRORS; OPTICAL TRANSFER FUNCTION; OPTICS; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

EXTREME ULTRAVIOLET PHOTORESIST; EXTREME ULTRAVIOLET WAVELENGTH; RESIST MODELING;

PHOTORESISTS;

EID: 1142267433     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.43.000788     Document Type: Article

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