Performance of EUV photoresists on the ALS micro exposure tool

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue II, 2005, Pages 754-764

  Köhler, Thomas ^a   Brainard, Robert L ^a   Naulleau, Patrick P ^b   Van Steenwinckel, David ^c   Lammers, Jeroen H ^c   Goldberg, Kenneth A ^b   Mackevich, Joseph F ^a   Trefonas, Peter ^a  

^a ROHM AND HAAS COMPANY   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^c PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

EUV; EUV 2D; MET; Photoresists

Indexed keywords

EUV; EUV-2D; HIGH RESOLUTION RESISTS; MICRO EXPOSURE TOOL (MET);

IMAGE ANALYSIS; LIGHT MODULATION; LIGHT SOURCES; OPTIMIZATION; SENSITIVITY ANALYSIS; ULTRAVIOLET RADIATION;

PHOTORESISTS;

EID: 24644457063     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600511     Document Type: Conference Paper

References (14)

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4. 2
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