Resist-based measurement of the contrast transfer function in a 0.3 numerical aperture extreme ultraviolet microfield optic

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 24, Issue 1, 2006, Pages 326-330

  Cain, Jason P ^a   Naulleau, Patrick ^b   Spanos, Costas J ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b STATE UNIVERSITY OF NEW YORK   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTRAST TRANSFER FUNCTIONS (CTF); PITCHES; PROJECTION OPTICS;

IMAGE ANALYSIS; LIGHT SOURCES; MICROOPTICS; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY; ULTRAVIOLET RADIATION;

TRANSFER FUNCTIONS;

EID: 31544458972     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2162578     Document Type: Article

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