Status of EUV microexposure capabilities at the ALS using the 0.3-NA MET optic

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5374, Issue PART 2, 2004, Pages 881-891

  Naulleau, Patrick ^a   Goldberg, Kenneth A ^a   Anderson, Erik ^a   Bradley, Kevin ^a   Delano, Rene ^a   Denham, Paul ^a   Gunion, Bob ^a   Harteneck, Bruce ^a   Hoef, Brian ^a   Huang, Hanjing ^a   Jackson, Keith ^a   Jones, Gideon ^a   Kemp, Drew ^a   Liddle, J Alexander ^a   Oort, Ron ^a   Rawlins, Al ^a   Rekawa, Seno ^a   Salmassi, Farhad ^a   Tackaberry, Ron ^a   Chung, Carl ^b   Hale, Layton ^b   Phillion, Don ^b   Sommargren, Gary ^b   Taylor, John ^b   more..

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Coherence; Extreme ultraviolet lithography; Synchrotron; Variable sigma illuminator

Indexed keywords

COHERENCE EFFECT; EXTREME ULTRAVIOLET LITHOGRAPHY; SYNCHROTRON BEAMS; VARIABLE-SIGMA ILLUMINATOR;

APPROXIMATION THEORY; COMPUTER AIDED DESIGN; LASER OPTICS; LIGHT SOURCES; MATHEMATICAL MODELS; OPTICAL RESOLVING POWER; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION;

PHOTOLITHOGRAPHY;

EID: 3843137187     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.556538     Document Type: Conference Paper

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