Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 23, Issue 6, 2005, Pages 2840-2843

  Naulleau, Patrick ^a   Cain, Jason P ^b   Anderson, Erik ^c   Dean, Kim ^d   Denham, Paul ^c   Goldberg, Kenneth A ^c   Hoef, Brian ^c   Jackson, Keith ^c  

^a STATE UNIVERSITY OF NEW YORK   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EUV LITHOGRAPHY; EXPOSURE TOOLS; EXTREME ULTRAVIOLET (EUV); NUMERICAL APERTURES (NA);

COHERENT LIGHT; ILLUMINATION METERS; LIGHT SOURCES; MASKS; PHOTOLITHOGRAPHY; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION;

EXPOSURE METERS;

EID: 29044442484     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2127940     Document Type: Article

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