Direct observation of two-dimensional growth at SiO2/Si(111) interface

Thin Solid Films

Volumn 515, Issue 20-21, 2007, Pages 7892-7898

  Hojo, Daisuke ^a   Tokuda, Norio ^a   Yamabe, Kikuo ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

Atomic force microscopy; Interface; Oxidation; Silicon; Step Terrace; Surface roughness

Indexed keywords

ATOMIC FORCE MICROSCOPY; GROWTH (MATERIALS); OXIDATION; SILICA; THIN FILMS;

ATOMIC LAYERS; OXIDE-ISLANDS;

INTERFACES (MATERIALS);

EID: 34547668650     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.05.011     Document Type: Article

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