Observation of oxide/Si(001)-interface during layer-by-layer oxidation by scanning reflection electron microscopy

Applied Physics Letters

Volumn 71, Issue 7, 1997, Pages 885-887

  Fujita, S ^a,c   Watanabe, H ^a,d   Maruno, S ^a   Ichikawa, M ^a   Kawamura, T ^b  

^a NATL INST FOR ADV INTERDISC RES   (Japan)

^b UNIVERSITY OF YAMANASHI   (Japan)

^c TOSHIBA CORPORATION   (Japan)

^d MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000842958     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120567     Document Type: Article

References (12)

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