Atomic force microscopy observations of Si surfaces after rinsing in ultrapure water with low dissolved oxygen concentration

Journal of the Electrochemical Society

Volumn 144, Issue 9, 1997, Pages 3204-3207

  Usuda, K ^a   Yamada, K ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; HYDROFLUORIC ACID; SURFACE CLEANING; SURFACE ROUGHNESS; WATER;

DISSOLVED OXYGEN; ULTRAPURE WATER RINSING;

SILICON WAFERS;

EID: 0031232566     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837984     Document Type: Article

References (7)

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