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Volumn 144, Issue 9, 1997, Pages 3204-3207
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Atomic force microscopy observations of Si surfaces after rinsing in ultrapure water with low dissolved oxygen concentration
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
ETCHING;
HYDROFLUORIC ACID;
SURFACE CLEANING;
SURFACE ROUGHNESS;
WATER;
DISSOLVED OXYGEN;
ULTRAPURE WATER RINSING;
SILICON WAFERS;
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EID: 0031232566
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.1837984 Document Type: Article |
Times cited : (18)
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References (7)
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