Effect of SiO2 fence on atomic step flow in chemical etching of Si surface

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 42, Issue 5 B, 2003, Pages

  Hojo, Daisuke ^a   Tokuda, Norio ^a   Yamabe, Kikuo ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

Anodic oxidation; Atomic force microscope (AFM); Atomic step flow; Atomically flat surface; Step free; Step pattern controlling; Surface roughening; Wet etching

Indexed keywords

ANODIC OXIDATION; ATOMIC FORCE MICROSCOPY; ETCHING; SILICA;

ATOMIC STEP FLOW;

SURFACE ROUGHNESS;

EID: 0038042463     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.l561     Document Type: Article

References (13)

1. N. Tokuda, K. Miki, S. Yamasaki and K. Yamabe: Jpn. J. Appl. Phys. 42 (2003) L160.
2. H. Omi and T. Ogino: J. Vac. Sci. & Technol. A 17 (1999) 1610.
3. T. Ogino, H. Hibino and Y. Homma: Appl. Surf. Sci. 117/118 (1997) 642.
4. N. Tokuda, M. Murata, D. Hojo and K. Yamabe: Jpn. J. Appl. Phys. 40 (2001) 4763.
5. D. Hojo, N. Tokuda and K. Yamabe: Jpn. J. Appl. Phys. 41 (2002) L505.
6. D. Lee, T. Schroeder, J. Engstrom and J. Blakely: Mater. Res. Soc. Symp. Proc. 648 (2001) 10.11.1.
7. H. Sakaue, E. Takahashi, T. Tanaka, S. Shingubara and T. Takahagi: Jpn. J. Appl. Phys. 36 (1997) 1420.
8. H. Fukidome and M. Matsumura: Jpn. J. Appl. Phys. 38 (1999) L1085.
9. L. Tsau, D. Wang and K. L. Wang: Appl. Phys. Lett. 64 (1994) 2133.
10. D. A. MacLaren, N. J. Curson, P. Atkinson and W. Allison: Surf. Sci. 490 (2001) 285.
11. L. Pauling: The Nature of the Chemical Bond and the Structure of Molecules and Crystals (Kyouritsu Publishing Co., Japan, 1977) Japanese ed., Chap. 3, p. 72.
12. H. Fukidome, M. Matsumura T. Komeda, K. Namba and Y. Nishioka: Electro Chem. & Solid-State Lett. 2 (1999) 393.
13. H. Fukidome and M. Matsumura: Surf. Sci. 463 (2000) L649.