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Physical Review Letters

Volumn 97, Issue 1, 2006, Pages

Scaling and universality of roughening in thermal oxidation of Si(001)

(3) Omi, Hiroo a Kageshima, Hiroyuki a Uematsu, Masashi a

a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; CONTINUUM MECHANICS; HIGH TEMPERATURE OPERATIONS; PHASE TRANSITIONS; SILICA;

ARGON ATMOSPHERE; CONTINUUM EQUATION; ROUGHENING; THERMAL OXIDATION;

SILICON;

EID: 33745769780 PISSN: 00319007 EISSN: 10797114 Source Type: Journal
DOI: 10.1103/PhysRevLett.97.016102 Document Type: Article

Times cited : (16)

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