Atomic-step observation at buried SiO2/Si(111) interfaces by scanning reflection electron microscopy

Surface Science

Volumn 385, Issue 2-3, 1997, Pages

  Watanabe, Heiji ^a   Fujita, Ken ^a   Ichikawa, Masakazu ^a  

^a NATL INST FOR ADV INTERDISC RES   (Japan)

Author keywords

Crystalline amorphous interfaces; Oxidation; Reflection electron microscopy; Scanning tunneling microscopy; Silicon; Silicon oxide; X ray photoelectron spectroscopy

Indexed keywords

AMORPHOUS MATERIALS; CHEMICAL BONDS; CRYSTALLINE MATERIALS; MICROSCOPIC EXAMINATION; OXIDATION; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SILICA; STRESS ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

SCANNING REFLECTION ELECTRON MICROSCOPY (SREM);

HETEROJUNCTIONS;

EID: 0031200217     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)00347-6     Document Type: Article

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