High-rate synthesis of microcrystalline silicon films using high-density SiH4/H2 microwave plasma

Thin Solid Films

Volumn 515, Issue 17, 2007, Pages 6713-6720

  Jia, Haijun ^a   Saha, Jhantu K ^a   Ohse, Naoyuki ^a   Shirai, Hajime ^a  

^a SAITAMA UNIVERSITY   (Japan)

Author keywords

High rate synthesis; Low defect density; Microcrystalline silicon; Microwave plasma

Indexed keywords

CARRIER CONCENTRATION; DEPOSITION; ELECTRON TEMPERATURE; OPTICAL EMISSION SPECTROSCOPY; PLASMA SOURCES; SYNTHESIS (CHEMICAL); THIN FILMS;

ATOMIC HYDROGEN; HIGH-RATE SYNTHESIS; LOW DEFECT DENSITY; MICROWAVE PLASMA; SPOKE ANTENNAS; SUBSTRATE TEMPERATURE;

MICROCRYSTALLINE SILICON;

EID: 34247645979     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.01.055     Document Type: Article

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