Origin of the improved performance of high-deposition-rate microcrystalline silicon solar cells by high-pressure glow discharge

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 42, Issue 8 A, 2003, Pages

  Matsui, Takuya ^a   Kondo, Michio ^a   Matsuda, Akihisa ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

High rate deposition; Microcrystalline silicon; Microstructure; PECVD; Post oxidation; Solar cell

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; DEPOSITION; GLOW DISCHARGES; GRAIN BOUNDARIES; GRAIN GROWTH; HIGH PRESSURE EFFECTS; OXIDATION; REDUCTION; SECONDARY ION MASS SPECTROMETRY; TRANSMISSION ELECTRON MICROSCOPY;

HIGH DEPOSITION RATE MICROCRYSTALLINE; HYDROGENATED MICROCRYSTALLINE SILICON;

SILICON SOLAR CELLS;

EID: 0141763574     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.l901     Document Type: Letter

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