Guiding principles for obtaining stabilized amorphous silicon at larger growth rates

Journal of Non-Crystalline Solids

Volumn 266-269 A, Issue , 2000, Pages 90-94

  Takai, M ^a   Nishimoto, T ^a   Takagi, T ^a   Kondo, M ^a   Matsuda, A ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002958679     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(99)00743-7     Document Type: Article

References (5)

1. T. Takagi, R. Hayashi, G. Ganguly, M. Kondo, A. Matsuda, Thin Solid Films 345 (1999) 75.
2. A. Matsuda, J. Vac. Sci. Technol. A 16 (1998) 365.
3. M. Tsuda, S. Oikawa, K. Sato, J. Chem. Phys. 91 (1989) 6822.
4. Y. Watanabe, M. Shiratani, T. Fukuzawa, H. Kawasaki, Y. Ueda, S. Singh, H. Ohkura, J. Vac. Sci. Technol. A 14 (1996) 995.
5. Y. Maemura, H. Fujiyama, T. Takagi, R. Hayashi, W. Futako, M. Kondo, A. Matsuda, Thin Solid Films 345 (1999) 80.