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Volumn 88, Issue 6, 2000, Pages 3674-3688

Contribution of ions to the growth of amorphous, polymorphous, and microcrystalline silicon thin films

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001322657     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1289523     Document Type: Article
Times cited : (101)

References (55)
  • 35
    • 85037516817 scopus 로고    scopus 로고
    • note
    • In order to take the collisions mathematically correctly into account, the integral in the second term of Eq. (1), which describes the ion contribution, should contain a factor exp(-r/λ). Here we made the approximation that r≈a.
  • 52
    • 85037498521 scopus 로고    scopus 로고
    • private communication
    • W. J. Goedheer, private communication.
    • Goedheer, W.J.1
  • 54
    • 0346318884 scopus 로고    scopus 로고
    • PhD thesis, Utrecht University, the Netherlands
    • E. A. G. Hamers, PhD thesis, Utrecht University, the Netherlands (1998).
    • (1998)
    • Hamers, E.A.G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.