SCOPUS 정보 검색 플랫폼

Journal of Non-Crystalline Solids

Volumn 299-302, Issue PART 1, 2002, Pages 68-73

Phase diagrams for Si:H film growth by plasma-enhanced chemical vapor deposition

(4) Ferlauto, A S a Koval, R J a Wronski, C R a Collins, R W a

a PENNSYLVANIA STATE UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELLIPSOMETRY; FILM GROWTH; PHASE DIAGRAMS; PHASE TRANSITIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; SUBSTRATES; THICKNESS MEASUREMENT;

REAL TIME SPECTROSCOPIC ELLIPSOMETRY (RTSE);

THIN FILMS;

EID: 0036540220 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-3093(01)00996-6 Document Type: Conference Paper

Times cited : (6)

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3
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.