Effects of chamber wall heating and quartz window on fast deposition of microcrystalline silicon films by high-density microwave plasma

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 12, 2004, Pages 7960-7965

  Jia, Haijun ^a   Nakajima, Masanobu ^a   Nakao, Aiko ^b   Shirai, Hajime ^a  

^a SAITAMA UNIVERSITY   (Japan)

^b INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

Author keywords

Chamber wall heating; Fast deposition; High density microwave plasma; Microcrystalline silicon; Oxygen impurity

Indexed keywords

MICROWAVES; PLASMA DENSITY; PLASMA DEVICES; SURFACE WAVES; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

CHAMBER WALL HEATING; FAST DEPOSITION; HIGH-DENSITY MICROWAVE PLASMA; MICROCRYSTALLINE SILICON; OXYGEN IMPURITY;

SILICON;

EID: 13644280605     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.7960     Document Type: Article

References (18)

1. H. Shirai, T. Arai and H. Ueyama: Thin Solid Films 296 (1997) 19.
2. A. L. Baia Neto, A. Lambertz, R. Carius and F. Finger: J. Non-Cryst. Solids 299 (2002) 274.
3. T. Kojima, A. Ohishi, H. Toyoda, M. Goto, M. Nishitani and H. Sugai: Jpn. J. Appl. Phys. 40 (2001) 322.
4. Y. Sakuma, L. Haiping, H. Ueyama and H. Shirai: Vacuum 59 (2000) 266.
5. T. Matusi, M. Tsukiji, H. Saika, T. Toyama and H. Okamoto: Jpn. J. Appl. Phys. 41 (2002) 20.
6. S. Somiya, Y. Yamauchi, H. Toyoda and H. Sugai: The 20th Symp. on Plasma Process, Naoka, Japan (2003) p. B3-5.
7. H. Shirai, Y. Sakuma and H. Ueyama: Thin Solid Films 345 (1999) 7.
8. H. Shirai, Y. Sakuma, K. Yoshino and H. Ueyama: Jpn. J. Appl. Phys. 39 (2000) L782.
9. M. J. Druyvesteyn: Zeitschrift fur Physik 64 (1930) 781.
10. H. Kawasaki, K. Sakamoto, T. Fukuzawa, M. Shiratani and Y. Watanabe: Jpn. J. Appl. Phys. 37 (1998) 5757.
11. M. Takai, T. Nishimoto, M. Kondo and A. Matsuda: Appl. Phys. Lett. 77 (2000) 2828.
12. M. Shiratani, S. Maeda, K. Koga and Y. Watanabe: Jpn. J. Appl. Phys. 39 (2000) 287.
13. S. Takashima, M. Hori, T. Goto, A. Kono and K. Yoneda: J. Appl. Phys. 90 (2001) 5497.
14. L. Guo, M. Kondo, M. Fukawa, K. Saitoh and A. Matsuda: Jpn. J. Appl. Phys. 37 (1998) L1116.
15. G. Ganguly and A. Matsuda: Phys. Rev. B 47 (1993) 3661.
16. A. Matsuda: Plasma Phys. Controlled Fusion 39 (1997) A431.
17. C. Niikura, N. Itagaki, M. Kondo, Y. Kawai and A. Matsuda: Thin Solid Films 457 (2004) 84.
18. M. Isomura, M. Kondo and A. Matsuda: Sol. Energy Mater. Sol. Cells 66 (2001) 375.