High density plasma enhanced chemical vapor deposition of optical thin films

EPJ Applied Physics

Volumn 26, Issue 1, 2004, Pages 3-9

  Daineka, D ^a   Bulkin, P ^a   Girard, G ^a   Bouree J E ^a   Drevillon B ^a  

^a LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; COATINGS; DOPING (ADDITIVES); GERMANIUM; HYDROGEN; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NITROGEN; OXYGEN; REFRACTIVE INDEX; SILANES; SILICA; TEMPERATURE;

FUNCTIONAL COATINGS; INJECTION SYSTEM; MATRIX DISTRIBUTED ELECTRON CYCLOTRON RESONANCE REACTOR; OPTICAL THIN FILMS; SILICON OXYNITRIDE FILMS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 1842865680     PISSN: 12860042     EISSN: None     Source Type: Journal    
DOI: 10.1051/epjap:2004013     Document Type: Article

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