Theoretical studies of displacement deposition of nickel into porous silicon with ultrahigh aspect ratio

Electrochimica Acta

Volumn 52, Issue 12, 2007, Pages 3901-3909

  Xu, Chengkun ^a   Li, Mingheng ^a   Zhang, Xi ^a   Tu, King Ning ^a   Xie, Yahong ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Current distribution; Deposition uniformity; Displacement deposition; Nickel plating; Porous silicon

Indexed keywords

ASPECT RATIO; ELECTRIC CURRENT DISTRIBUTION; ELECTRODEPOSITION; NICKEL PLATING; PARTICLE SIZE ANALYSIS; POLARIZATION; PORE SIZE; POROUS SILICON; SURFACE CHEMISTRY;

DISPLACEMENT DEPOSITION; INTERFACIAL REACTION CONTROL; PORE DEPTH;

NICKEL;

EID: 33847311695     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2006.11.007     Document Type: Article

References (59)

1. Hamm D., Sakka T., and Ogata Y.H. Phys. Status Solid C: Conf. Crit. Rev. 2 (2005) 3334
2. Hamm D., Sakka T., and Ogata Y.H. Electrochim. Acta 49 (2004) 4949
3. Sasano J., Schmuki P., Sakka T., and Ogata Y.H. Electrochem. Solid-State Lett. 7 (2004) G98
4. Steiner P., Kozlowski F., and Lang W. Thin Solid Films 255 (1995) 49
5. Harraz F.A., Tsuboi T., Sasano J., Sakka T., and Ogata Y.H. J. Electrochem. Soc. 149 (2002) C456
6. Ronkel F., Schultze J.W., and Arens-Fischer R. Thin Solid Films 276 (1996) 40
7. Jeske M., Schultze J.W., Thonissen M., and Munder H. Thin Solid Films 255 (1995) 63
8. Dhar S., and Chakrabarti S. Semicond. Sci. Technol. 11 (1996) 1231
9. Gole J.L., Seals L.T., and Lillehei P.T. J. Electrochem. Soc. 147 (2000) 3785
10. Tsuboi T., Sakka T., and Ogata Y.H. J. Appl. Phys. 83 (1998) 4501
11. Harraz F.A., Sakka T., and Ogata Y.H. Electrochim. Acta 47 (2002) 1249
12. Harraz F.A., Sasano J., Sakka T., and Ogata Y.H. J. Electrochem. Soc. 150 (2003) C277
13. Chan S., Kwon S., Koo T., Lee L.P., and Berlin A.A. Adv. Mater. 15 (2003) 1595
14. Lin H., Mock J., Smith D., Gao T., and Sailor M.J. J. Phys. Chem. B 108 (2004) 11654
15. Coulthard, Degen S., Zhu Y.-J., and Sham T.K. Can. J. Chem. 76 (1998) 1707
16. Herino R., Jan P., and Bomchil G. J. Electrochem. Soc. 132 (1985) 2513
17. Kordas K., Leppavuori S., Bekesi J., Nanai L., Remes J., Vajtai R., and Szatmari S. Appl. Surf. Sci. 186 (2002) 232
18. Chong K., Zhang X., Tu K.-N., Huang D., (Frank) Chang M.-C., and Xie Y.-H. IEEE Trans. Electron Devices 52 (2005) 2440
19. Herino R. Mater. Sci. Eng. B 69-70 (2000) 70
20. Yung E.K., Romankiw L.T., and Alkire R.C. J. Electrochem. Soc. 136 (1989) 206
21. Yung E.K., and Romankiw L.T. J. Electrochem. Soc. 136 (1989) 756
22. Hazlebeck D.A., and Talbot J.B. AIChE J. 36 (1990) 1145
23. Alkire R., and Mirarefi A.A. J. Electrochem. Soc. 120 (1973) 1507
24. Kessler T., and Alkire R. J. Electrochem. Soc. 123 (1976) 990
25. Alkire R.C., and Ju J.-B. J. Electrochem. Soc. 134 (1987) 1172
26. Lanzi O., and Landau U. J. Electrochem. Soc. 135 (1988) 1922
27. Pesco A.M., and Cheh H.Y. J. Electrochem. Soc. 136 (1989) 399
28. Lee J.-M., and West A.C. J. Electrochem. Soc. 152 (2005) C645
29. Ting C.H., and Paunovic M. J. Electrochem. Soc. 136 (1989) 456
30. Ting C.H., Paunovic M., Pai P.L., and Chiu G. J. Electrochem. Soc. 136 (1989) 462
31. Cachet H., Froment M., and Souteyrand E. J. Electrochem. Soc. 139 (1992) 2920
32. Andricacos P.C., Uzoh C., Dukovic J.O., Horkans J., and Deligianni H. IBM J. Res. Dev. 42 (1998) 567
33. Kelly J.J., and West A.C. Electrochem. Solid-State Lett. 2 (1999) 561
34. Kelly J.J., Tian C., and West A.C. J. Electrochem. Soc. 146 (1999) 2540
35. West A.C. J. Electrochem. Soc. 147 (2000) 227
36. Georgiadou M., Veyret D., Sani R.L., and Alkire R.C. J. Electrochem. Soc. 148 (2001) C54
37. Moffat T.P., Bonevich J.E., Huber W.H., Stanishevsky A., Kelly D.R., Stafford G.R., and Josella D. J. Electrochem. Soc. 147 (2000) 4524
38. Kobayashi T., Kawasaki J., Mihara K., and Honma H. Electrochim. Acta 47 (2001) 85
39. Josell D., Wheeler D., Huber W.H., and Josell D. Electrochem. Solid-State Lett. 4 (2001) C26
40. West A.C., Mayer S., and Reid J. Electrochem. Solid-State Lett. 4 (2001) C50
41. Josell D., Wheeler D., Huber W.H., Bonevich J.E., and Moffat T.P. J. Electrochem. Soc. 148 (2001) C767
42. Josell D., Wheeler D., and Moffat T.P. Electrochem. Solid-State Lett. 5 (2002) C49
43. Toshio H., Takeyuki I., Haruo A., Akihiro S., Kinya K., and Hirosh M. Mater. Trans. 43 (2002) 1593
44. Josell D., Baker B., Witt C., Wheeler D., and Moffat T.P. J. Electrochem. Soc. 149 (2002) C637
45. Wheeler D., Josell D., and Moffat T.P. J. Electrochem. Soc. 150 (2003) C302
46. Vereecken P.M., Binstead R.A., Deligianni H., and Andricacos P.C. IBM J. Res. Dev. 49 (2005) 3
47. Moffat T.P., Wheeler D., Edelstein M.D., and Josell D. IBM J. Res. Dev. 49 (2005) 19
48. Dukovic J.O., and Tobias C.W. J. Electrochem. Soc. 137 (1990) 3748
49. Madore C., Matlosz M., and Landolt C. J. Electrochem. Soc. 143 (1996) 3927
50. Bindra P., Light D., and Rath D. IBM J. Res. Dev. 28 (1984) 668
51. Hume III E.C., Deen W.M., and Brown R.A. J. Electrochem. Soc. 131 (1984) 1251
52. Chemical Rubber Company. CRC Handbook of Chemistry and Physics. 74th ed. (1993/1994), CRC Press, Cleveland, OH p. 5, 8
53. Bard A.J. Encyclopedia of Electrochemistry of the Elements vol. III (1973), M. Dekker, New York p. 282, 306
54. Martell A.E., and Smith R.M. Critical Stability Constants vol. 4 (1974), Plenum Press, New York p. 40
55. Roha D., and Landau U. J. Electrochem. Soc. 137 (1990) 824
56. Jordan K.G., and Tobias C.W. J. Electrochem. Soc. 138 (1991) 1251
57. Madore C., and Landolt D. J. Electrochem. Soc. 143 (1996) 3936
58. Cheng C.-C., and West A.C. J. Electrochem. Soc. 144 (1997) 3050
59. Cheng C.-C., and West A.C. J. Electrochem. Soc. 145 (1998) 560