Nickel deposition on porous silicon utilizing lasers

Applied Surface Science

Volumn 186, Issue 1-4, 2002, Pages 232-236

  Kordas K ^a   Leppavuori S ^a   Bekesi J ^b   Nanai L ^c   Remes, J ^a   Vajtai, R ^c,d   Szatmari S ^c  

^a UNIVERSITY OF OULU   (Finland)

^b LASER LABORATORIUM GÖTTINGEN E V   (Germany)

^c UNIVERSITY OF SZEGED   (Hungary)

^d RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

Laser processing; Metallization; Photoelectric effect; Porous silicon; Semiconductors

Indexed keywords

ELECTROLESS PLATING; ENERGY DISPERSIVE SPECTROSCOPY; LASER BEAM EFFECTS; METALLIZING; NEODYMIUM LASERS; PHOTOCHEMICAL REACTIONS; PHOTOELECTRICITY; POROUS SILICON; Q SWITCHED LASERS; SCANNING ELECTRON MICROSCOPY; SURFACE CHEMISTRY;

LASER-INDUCED PHOTOCHEMICAL METALLIZATION;

NICKEL PLATING;

EID: 0037185152     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00636-5     Document Type: Conference Paper

References (15)