Electrical contact to porous silicon by electrodeposition of iron

Thin Solid Films

Volumn 276, Issue 1-2, 1996, Pages 40-43

  Ronkel, F ^a   Schultze, J W ^a   Arens Fischer, R ^b  

^a HEINRICH HEINE UNIVERSITY   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Deposition process; Electrochemistry; Silicon; X ray photoelectron spectroscopy (XPS)

Indexed keywords

DISSOLUTION; ELECTROCHEMISTRY; ELECTRODEPOSITION; IRON; X RAY PHOTOELECTRON SPECTROSCOPY;

ANODIC DISSOLUTION;

POROUS SILICON;

EID: 0030124033     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(95)08045-7     Document Type: Article

References (4)

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3. M. Jeske, K.G. Jung, J.W. Schultze, M. Thönissen and H. Münder, Surf. Interf. Anal., 22 (1994) 363.
4. J.W. Schultze and K.G. Jung, Electrochim. Acta, 40 (1995) 1369.