SCOPUS 정보 검색 플랫폼

Journal of Crystal Growth

Volumn 285, Issue 1-2, 2005, Pages 208-214

Characterisation of epitaxial TiO2 thin films grown on MgO(0 0 1) using atomic layer deposition

(3) Mitchell, D R G a Attard, D J a Triani, G a

a AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION (Australia)

Author keywords

A1. Transmission electron microscopy; A3. Atomic layer deposition; A3. Epitaxy; B1. MgO substrate; B1. TiO2

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL MICROSTRUCTURE; DEPOSITION; EPITAXIAL GROWTH; MAGNESIA; MORPHOLOGY; SILICON; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

ATOMIC LAYER DEPOSITION; MGO SUBSTRATES; ORIENTATIONAL VARIENTS; TIO2;

TITANIUM OXIDES;

EID: 27144518000 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcrysgro.2005.08.003 Document Type: Article

Times cited : (11)

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