Preparation of diamond wafers by DC arcjet plasma process under a gas recycling mode

Diamond and Related Materials

Volumn 10, Issue 3-7, 2001, Pages 327-331

  Tang, W ^a   Liu, J ^a   Huang, T ^a   Lu, F ^a  

^a PEKING UNIVERSITY   (China)

Author keywords

Characterization; CVD; DC plasma CVD; Diamond

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CONTAMINATION; LIGHT ABSORPTION; NITROGEN; PLASMA WELDING;

DIAMOND WAFERS;

DIAMONDS;

DIAMOND;

EID: 0035270080     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00592-6     Document Type: Article

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