Absolute concentration measurements of CH radicals in a diamond-depositing dc-arcjet reactor

Applied Optics

Volumn 36, Issue 15, 1997, Pages 3261-3270

  Luque, J ^a   Juchmann, W ^a,b   Jeffries, J B ^a  

^a SRI INTERNATIONAL   (United States)

^b UNIVERSITY OF HEIDELBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000974333     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.36.003261     Document Type: Article

References (31)

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