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Volumn 108, Issue 28, 2004, Pages 9821-9828

Surface reactivity of OH molecules during deposition of SiO2 from siloxane-based plasmas

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; DEPOSITION; FILM GROWTH; ISOTOPES; ORGANIC COMPOUNDS; OXIDATION; PHASE SEPARATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SUBSTRATES; SURFACE CHEMISTRY;

EID: 3442899332     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp031222x     Document Type: Article
Times cited : (7)

References (38)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.