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Volumn 11, Issue 1, 2002, Pages 92-97

E and H regimes of plasma enhanced chemical vapor deposition of diamond-like carbon film in low frequency inductively coupled plasma reactor

(3) Sun, Z a Xu, S b,c Ostrikov, K N a,b

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

b NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

c NAGOYA UNIVERSITY (Japan)

Author keywords

Diamond like carbon; Inductively coupled plasma; Mode transitions; Plasma enhanced chemical vapor deposition

Indexed keywords

COMPRESSIVE STRESS; ELASTIC MODULI; FILM PREPARATION; HARDNESS; HYDROGENATION; INDUCTIVELY COUPLED PLASMA; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA SOURCES; SILICON WAFERS;

CAPACITIVELY COUPLED PLASMA SOURCES;

DIAMOND LIKE CARBON FILMS;

CARBON; DIAMOND; WEAR;

EID: 0036151980 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(01)00524-6 Document Type: Article

Times cited : (8)

References (34)

1
- 0008076313
- (1890) J. Vac. Sci. Technol. A , vol.16 , pp. 1998
- Zabinski, J.S.¹ Voevodin, A.A.²

2
- 0000720680
- (1999) J. Appl. Phys , vol.85 , pp. 3142
- Sharf, T.W.¹ Ott, R.D.² Yang, D.³ Barnard, J.A.⁴

3
- 22644452191
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 679
- Evtukh, A.A.¹ Litovchenko, V.G.² Klyui, N.I.³ Marchenko, R.I.⁴ Kudzinovski, S.Yu.⁵

4
- 0000286809
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 731
- Nonogaki, R.¹ Yamada, S.² Araki, T.³ Wada, T.⁴

5
- 0001311059
- (1995) J. Appl. Phys , vol.78 , pp. 4267
- Hanabusa, M.¹ Tsujihara, K.²

6
- 0033458417
- (1999) J. Vac. Sci. Technol. A , vol.17 , pp. 3406
- Wei, Q.¹ Narayan, R.J.² Sharma, A.K.³ Sankar, J.⁴ Narayan, J.⁵

7
- 0008153419
- (1836) Appl. Phys. Lett , vol.58 , pp. 1991
- Kumar, S.¹

8
- 0029756441
- (1996) J. Mater. Res , vol.11 , pp. 221
- Andry, P.S.¹ Pastel, P.W.² Varhue, W.J.³

9
- 22844454903
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 2129
- Senkevich, J.J.¹ Leber, D.E.² Tutor, M.J.³ Heiks, N.A.⁴ Ten Eyck, G.A.⁵ Scherrer, D.W.⁶

10
- 0001769107
- (1996) Appl. Phys. Lett , vol.69 , pp. 49
- Kumar, S.¹ Dixit, P.N.² Saranji, D.³ Bhattacharyya, R.⁴

11
- 22644449601
- (1999) J. Vac. Sci. Technol. B , vol.17 , pp. 822
- He, X.-M.¹ Bardeau, J.-F.² Lee, D.H.³ Walter, K.C.⁴ Tuszewski, M.⁵ Nastasi, M.⁶

12
- 0004076374
- (Eds.), Plenum Press, NY
- (1991) Diamond and Diamond-Like Films and Coatings
- Clausing, R.E.¹ Horton, L.L.² Angus, J.C.³ Koidl, P.⁴

13
- 0000737145
- (2000) J. Appl. Phys , vol.87 , pp. 8122
- Sun, Z.¹ Lin, C.H.² Lee, Y.L.³ Shi, J.R.⁴ Tay, B.K.⁵ Shi, X.⁶

14
- 0003502871
- Institute of Physics, Philadelphia, PA
- (1996) Handbook of Thin Film Process Technology

15
- 0003730831
- Wiley, NY
- (1994) Principles of Plasma Discharges and Materials Processing
- Lieberman, M.A.¹ Lichtenberg, A.J.²

16
- 3943055339
- (1992) Plasma Sources Sci. Technol , vol.1 , pp. 109
- Hopwood, J.¹

17
- 0030134327
- (1996) Plasma Sources Sci. Technol , vol.5 , pp. 166
- Keller, J.H.¹

18
- 0032688388
- (1999) Plasma Sources Sci. Technol , vol.8 , pp. 313
- Turner, M.M.¹ Lieberman, M.A.²

19
- 0000340410
- (1998) Plasma Sources Sci. Technol , vol.7 , pp. 3082
- El-Fayoumi, I.M.¹ Jones, I.R.² Turner, M.M.³

20
- 0031998436
- (1998) Plasma Sources Sci. Technol , vol.7 , pp. 13
- Suzuki, K.¹ Nakamura, K.² Ohkubo, H.³ Sugai, H.⁴

21
- 0034272634
- (2000) J. Vac. Sci. Technol , vol.18 A , pp. 2185
- Xu, S.¹ Ostrikov, K.N.² Luo, W.³ Lee, S.⁴

22
- 0008124360
- (2000) Physica Scripta , vol.61 , pp. 189
- Ostrikov, K.N.¹ Xu, S.² Lee, S.³

23
- 0008077454
- in press
- J. Vac. Sci. Technol. A
- Shafiul Azam, B.M.¹ Ostrikov, K.N.² Xu, S.³

24
- 0008084852
- (1998) Jpn. J. Appl. Phys , vol.37 , pp. 3486
- Endo, K.¹ Miyamura, T.² Kitaori, N.³ Yoshida, O.⁴

25
- 0000630514
- (1995) Diamond Relat. Mater , vol.4 , pp. 304
- Schwan, J.¹ Ulrich, S.² Jung, K.³ Ehrhardt, H.⁴ Samlenski, R.⁵ Brenn, R.⁶

26
- 0033883843
- (2000) J. Non-Cryst. Solid , vol.261 , pp. 211
- Sun, Z.¹

27
- 2142845170
- (1988) J. Vac. Sci. Technol. A , vol.6 , pp. 1783
- Nemanich, R.J.¹ Glass, J.T.² Lucovsky, G.³ Shroder, R.E.⁴

28
- 85176529804
- (1985) Appl. Phys. Lett , vol.47 , pp. 1350
- Gonzales-Hernandes, J.¹ Azarbayajani, G.H.² Tsu, R.³ Polak, F.H.⁴

29
- 21544483271
- (1991) Appl. Phys. Lett , vol.58 , pp. 592
- Tamor, M.A.¹ Vasell, W.C.² Karduner, K.R.³

30
- 0008032866
- (1990) Mater. Sci. Forum , vol.52 , pp. 41
- Koildl, P.¹ Wild, C.² Dischler, B.³ Wagner, J.⁴ Ramsteiner, M.⁵

31
- 0032476354
- (1998) Thin Solid Films , vol.332 , pp. 113
- Marques, F.C.¹ Lacerda, R.G.² Odo, G.Y.³ Lepienski, C.M.⁴

32
- 0010360795
- (1998) Appl. Phys. Lett , vol.73 , pp. 2423
- Lee, D.H.¹ He, X.M.² Walter, K.C.³

33
- 0032205002
- (1998) Thin Solid Films , vol.333 , pp. 103
- Teii, K.¹

34
- 0033354172
- (1999) Thin Solid Films , vol.355-356 , pp. 146
- Sun, Z.¹ Shi, X.² Liu, E.³

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