Molecular challenges of immersion and extreme ultraviolet (EUV) resists

Journal of Photopolymer Science and Technology

Volumn 19, Issue 4, 2006, Pages 487-499

  Dean, Kim R ^a   Stark, David ^a  

^a SEMATECH   (United States)

Author keywords

193 nm immersion; EUV resist; Extreme ultraviolet (EUV); High index fluids; Immersion resist

Indexed keywords

EID: 33748462861     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.19.487     Document Type: Article

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