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Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue I, 2005, Pages 467-475

Material design and evaluation of nanocomposite resist for next generation lithography

(7) Gonsalves, Kenneth E a Thiyagarajan, Muthiah a Dean, Kim b Santiago, Patricia c Rendon L c Jeyakumar, Augustin d Henderson, Clifford L d

a UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (United States)

b SEMATECH (United States)

c UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO (Mexico)

d Georgia Institute of Technology (United States)

Author keywords

Adamantyl methacrylate; E beam lithography; Hydroxystyrene; KrF lithography; Nanocomposites; Resist

Indexed keywords

ADAMANTYL METHACRYLATE; HYDROXYSTYRENE; KRF LITHOGRAPHY; NANOCOMPOSITES; RESISTS;

ETCHING; FREE RADICAL POLYMERIZATION; HIGH RESOLUTION ELECTRON MICROSCOPY; METALLIC FILMS; NANOSTRUCTURED MATERIALS; ORGANIC POLYMERS; POLYCRYSTALS; SYNTHESIS (CHEMICAL);

ELECTRON BEAM LITHOGRAPHY;

EID: 24644453953 PISSN: 16057422 EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.597308 Document Type: Conference Paper

Times cited : (12)

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