Contamination transport in immersion lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 5, Issue 1, 2006, Pages

  Nellis, Gregory F ^a   El Morsi, Mohamed S ^a   Van Peski, Chris ^b   Grenville, Andrew ^b  

^a University of Wisconsin Madison   (United States)

^b SEMATECH   (United States)

Author keywords

Computational fluid dynamics simulations; Immersion lithography; Lens contamination

Indexed keywords

COMPUTATIONAL FLUID DYNAMICS SIMULATIONS; IMMERSION LITHOGRAPHY; LENS CONTAMINATION; PHOTOACID GENERATORS; TRANSIENT FLOW CONDITIONS;

COMPUTATIONAL FLUID DYNAMICS; FLUXES; LIGHT TRANSMISSION; OPTICAL RESOLVING POWER;

PHOTOLITHOGRAPHY;

EID: 33748581293     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2167947     Document Type: Article

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