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Volumn 6153 II, Issue , 2006, Pages

Molecular resists based on cholate derivatives for electron-beam lithography

Author keywords

Chemically amplified positive tone resist; Cholic acid; Line edge roughness; Molecular resist

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ESTERIFICATION; GLASS TRANSITION; ORGANIC COMPOUNDS; SILICON WAFERS; THIN FILMS;

CHEMICALLY AMPLIFIED POSITIVE-TONE RESIST; CHOLIC ACID; LINE EDGE ROUGHNESS; MOLECULAR RESIST;

PHOTORESISTS;

EID: 33745599363 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.656949 Document Type: Conference Paper

Times cited : (15)

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