Nanocomposite liquids for 193 nm immersion lithography: A progress report

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue II, 2005, Pages 847-850

  Chumanov, George ^a   Evanoff Jr , David D ^a   Luzinov, Igor ^b   Klep, Viktor ^b   Zdyrko, Bogdan ^b   Conley, Will ^c   Zimmerman, Paul ^d  

^a CLEMSON UNIVERSITY   (United States)

^b AMRL   (United States)

^c SEMATECH   (United States)

^d INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION COEFFICIENTS; IMMERSION LITHOGRAPHY; NANOCOMPOSITE LIQUIDS; SOLID PARTICLES;

ABSORPTION; ALUMINA; HYDROLYSIS; NANOSTRUCTURED MATERIALS; REFRACTIVE INDEX; RHEOLOGY; SCANNING; SEMICONDUCTOR DEVICES;

PHOTORESISTS;

EID: 24644469031     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.601479     Document Type: Conference Paper

References (0)