Characterisation of the ultrasonic development process in UVIII resist

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 471-474

  Yasin, Shazia ^a   Mumtaz, A ^a   Hasko, D G ^a   Carecenac, F ^b   Ahmed, H ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b Laboratoire de Microstructures (L2M CNRS)   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLICS; COMPUTER SIMULATION; DISSOLUTION; ELECTRON BEAM LITHOGRAPHY; MONTE CARLO METHODS; POLYSTYRENES; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; ULTRASONICS;

CHEMICALLY AMPLIFIED RESIST; LINE EDGE ROUGHNESS;

PHOTORESISTS;

EID: 0034206236     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00358-0     Document Type: Article

References (11)

1. 1. W. Chen and H. Ahmed, Appl. Phys. Lett. 62, 1499 (1993).
2. 2. K. L. Lee et al., J. Vac. Sci. Technol. B15, 2621 (1997).
3. 3. Shazia Yasin, D. G. Hasko and H. Ahmed, presented at EIPBN June 1999.
4. 4. T. Iwamoto et al., Jap. J. App. Phys. Lett. 33, 491 (1994).
5. 5. D. Macintyre and S. Thoms, Microelectronic Engineering 35, 213 (1997)
6. 6. D.P Mancini et al., SPIE, 2723 (1996).
7. 7. J. C. H. Phang and H. Ahmed. J. Vac. Sci. Technol. 16, 1754 (1979).
8. 8. T. Itani et al., J. Vac. Sci. Technol. B 15, 2541 (1997).
9. 8. H. Namatsu et al., J. Vac. Sci. Technol. B 16, 3315 (1998).
10. 10. G. W. Reynolds and J. W. Taylor, J. Vac. Sci. Technol. B 17, 334 (1999).
11. 11. Elizbeth A. Dobisz et al., Appl. Phys. Lett. 74, 4064 (1999).