Amplitude and spatial frequency characterization of line edge roughness using CD-SEM

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4689 I, Issue , 2002, Pages 347-355

  Eytan, Guy ^a   Dror, Ophir ^a   Ithier, Laurent ^b   Florin, Brigitte ^c   Lamouchi, Zakir ^c   Martin, Nadine ^c  

^a Applied Materials Inc Israel   (Israel)

^b Applied Materials   (France)

^c CEA LETI   (France)

Author keywords

CD SEM; FEM wafer; Line edge roughness

Indexed keywords

ALGORITHMS; ATOMIC FORCE MICROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

CRITICAL DIMENSIONS (CD); LINE EDGE ROUGHNESS;

ROUGHNESS MEASUREMENT;

EID: 0036030582     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.473473     Document Type: Article

References (5)

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