Controlling line-edge roughness to within reasonable limits

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 376-383

  Cobb, Jonathan ^a   Rauf, Shahid ^a   Thean, Aaron ^a   Dakshina Murthy, S ^b   Stephens, Tab ^a   Parker, Colita ^a   Peters, Richie ^a   Rao, Vivek ^a  

^a MOTOROLA INC   (United States)

^b ADVANCED MICRO DEVICES   (United States)

Author keywords

Device modeling; Line edge roughness; Process modeling; Resist diffusion; Resolution

Indexed keywords

ELECTRIC PROPERTIES; IMAGE QUALITY; MATHEMATICAL MODELS; POLYSILICON; SEMICONDUCTOR DEVICES; SURFACE ROUGHNESS;

CRITICAL DIMENSION; IMPLANT DIFFUSION; LINE EDGE ROUGHNESS;

PHOTORESISTS;

EID: 0141499961     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485169     Document Type: Conference Paper

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