Unbiased estimation of linewidth roughness

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue I, 2005, Pages 480-488

  Villarrubia, J S ^a   Bunday, B D ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b SEMATECH   (United States)

Author keywords

Line edge roughness (LER); Linewidth roughness (LWR); Measurement algorithms; Measurement bias; Scanning electron microscopy (SEM)

Indexed keywords

LINE EDGE ROUGHNESS (LER); LINEWIDTH ROUGHNESS (LWR); MEASUREMENT ALGORITHMS; MEASUREMENT BIAS;

ALGORITHMS; MEASUREMENT ERRORS; OPTICAL VARIABLES MEASUREMENT; SCANNING ELECTRON MICROSCOPY; SPURIOUS SIGNAL NOISE;

MEASUREMENT THEORY;

EID: 24644477476     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599981     Document Type: Conference Paper

References (12)

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7. International Technology Roadmap for Semiconductors (ITRS), 2003 Edition, http://public.itrs.net.
8. B. D. Bunday, M. Bishop, D. McCormack, J. S. Villarrubia, A. E. Vladar, R. Dixson, T. Vorburger, and N. G. Orji, "Determination of Optimal Parameters for CD-SEM Measurement of Line Edge Roughness," Proc. SPIE 5375, 515-533 (2004).
9. J. S. Villarrubia, A. E. Vladár, M. T. Postek, "A simulation study of repeatability and bias in the CD-SEM," Proc. SPIE 5038, 138-149, 2003.
10. B. D. Bunday, M. Bishop, J. S. Villarrubia, and A. E. Vladár, "CD-SEM Measurement of Line Edge Roughness Test Patterns for 193 nm Lithography," Proc. SPIE 5038, 2003, pp. 674-688
11. V.A. Ukraintsev, "Effect of Bias Variation on Total Uncertainty of CD Measurements," Proc. SPIE 5038, 644-650(2003).
12. J. S. Villarrubia, A. E. Vladár, and M. T. Postek, "Scanning electron microscope dimensional metrology using a model-based library," submitted to Surface and Interface Analysis.