Effect of aerial image contrast on resist line-edge roughness

Microlithography World

Volumn 8, Issue 3, 1999, Pages 19-21

  Sanchez, Martha I ^a   Hinsberg, William D ^a   Houle, Frances A ^a   Hoffnagle, John A ^a   Ito, Hiroshi ^a   Nguyen, Cattien ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE ANALYSIS; IMAGE QUALITY; INTERFEROMETRY; OPTICAL CORRELATION; SURFACE ROUGHNESS; ULTRAVIOLET RADIATION;

AERIAL IMAGE CONTRAST (AIC); LINE-EDGE ROUGHNESS; ULTRAVIOLET (UV) INTERFEROMETRIC LITHOGRAPHY;

PHOTORESISTS;

EID: 0032682126     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (10)