Conduction and charge analysis of metal (Al, W and Au)-Ta2O 5/SiO2-Si structures

Semiconductor Science and Technology

Volumn 21, Issue 7, 2006, Pages 945-951

  Novkovski, N ^a  

^a SS CYRIL AND METHODIUS UNIVERSITY   (Macedonia)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; LEAKAGE CURRENTS; SILICON; TANTALUM COMPOUNDS; THICK FILMS;

FLATBAND VOLTAGE; INTERFACIAL LAYER; METAL SURFACE; POOLE-FRENKEL CONDUCTIVITY;

METAL INSULATOR TRANSITION;

EID: 33745287851     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/21/7/020     Document Type: Article

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