Study on the initial deposition of ZrO 2 on hydrogen terminated silicon and native silicon oxide surfaces by high vacuum chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 1, 2005, Pages 165-176

  Song, Zhe ^a   Sullivan, Lisa M ^b   Rogers, Bridget R ^a  

^a VANDERBILT UNIVERSITY   (United States)

^b VANDERBILT UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION PROCESSES; FILM DENSITIES; SILICON OXIDE SURFACES;

CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; ELLIPSOMETRY; REFRACTIVE INDEX; SILICA; SPECTROSCOPIC ANALYSIS; SURFACES;

ZIRCONIA;

EID: 31144468035     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1842115     Document Type: Article

References (41)

1. R. Liu, Mater. Res. Soc. Symp. Proc. 670, K1.1.1 (2001).
2. G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys. 89, 5243 (2001).
3. R. M. Wallace and G. Wilk, MRS Bull. 27, 186 (2002).
4. D. G. Schlom and J. H. Haeni, MRS Bull. 27, 198 (2002).
5. B. W. Busch, O. Pluchery, Y. J. Chabal, D. A. Muller, R. L. Opila, J. R. Kwo, and E. Garfunkel, MRS Bull. 27, 206 (2002).
6. J. Robertson, J. Vac. Sci. Technol. B 18, 1785 (2000).
7. L. Manchanda, Microelectron. Eng. 59, 351 (2001).
8. G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys. 87, 484 (2000).
9. V. Misra, G. Lucovsky, and G. Parsons, MRS Bull. 27, 212 (2002).
10. S. A. Campbell, The Science and Engineering of Microelectronic Fabrication (Oxford University Press, New York, 1996), pp. 68-97.
11. R. S. Muller and T. I. Kamins, Device Electronics for Integrated Circuits, 2nd ed. (Wiley, New York, 1986), pp. 379-516.
12. K. J. Hubbard and D. G. Schlom, J. Mater. Res. 11, 2757 (1996).
13. J. P. Chang, Y. S. Lin, S. Berger, A. Kepten, R. Bloom, and S. Levy, J. Vac. Sci. Technol. B 19, 2137 (2001).
14. J. P. Chang, Y.-S. Lin, and K. Chu, J. Vac. Sci. Technol. B 19, 1782 (2001).
15. H. W. Chen, T. Y. Huang, D. Landheer, X. Wu, S. Moisa, G. I. Sproule, and T. S. Chao, J. Electrochem. Soc. 149, F49 (2002).
16. W. Chism, A. Diebold, J. Canterbury, and C. Richter, in Ultra Clean Processing of Silicon Surfaces 2000 (Scitec, Uetikon-Zuerich, 2001), Vol. 76-77, pp. 177-180.
17. M. A. Cameron and S. M. George, Thin Solid Films 348, 90 (1999).
18. X. Wu, D. Landheer, M. J. Graham, H. W. Chen, T. Y. Huang, and T. S. Chao, J. Cryst. Growth 250, 479 (2003).
19. S. K. Dey, C. G. Wang, D. Tang, M. J. Kim, R. W. Carpenter, C. Werkhoven, and E. Shero, J. Appl. Phys. 93, 4144 (2003).
20. W. Tsai, Microelectron. Eng. 65, 259 (2003).
21. G. Scarel, S. Ferrari, S. Spiga, C. Wiemer, G. Tallarida, and M. Fanciulli, J. Vac. Sci. Technol. A 21, 1359 (2003).
22. M. Ritala and M. Leskela, Appl. Surf. Sci. 75, 333 (1994).
23. D. H. Kuo and C. H. Chien, Thin Solid Films 429, 40 (2003).
24. J. P. Riviere, S. Harel, P. Guerin, and A. Straboni, Surf. Coat. Technol. 84, 470 (1996).
25. K. Goedicke, J.-S. Liebig, O. Zywitzki, and H. Sahm, Thin Solid Films 377-378, 37 (2000).
26. W. K. Chim, T. H. Ng, B. H. Koh, W. K. Choi, J. X. Zheng, C. H. Tung, and A. Y. Du, J. Appl. Phys. 93, 4788 (2003).
27. S. Chatterjee, S. K. Samanta, H. D. Banerjee, and C. K. Maiti, Bull. Mater. Sci. 24, 579 (2001).
28. T. Go, N. Hara and K. Sugimoto, J. Jpn. Inst. Met. 57, 1041 (1993).
29. K. Kukli, J. Cryst. Growth 231, 262 (2001).
30. D. C. Bradley and M. M. Faktor, Trans. Faraday Soc. 55, 2117 (1959).
31. H. G. Tompkins and W. A. McGahan, Spectroscopic Ellipsometry and Reflectometry: A User's Guide (Wiley, New York, 1999).
32. T. Kubota, N. Hara, and K. Sugimoto, J. Electrochem. Soc. 148, C632 (2001).
33. R. C. Garvie, J. Phys. Chem. 82, 218 (1978).
34. I. J. A. Woollam Co., Easy-to-Use Acquisition/Analysis Software for Spectroscopic Ellipsometry (EASE™) Manual (Software Manual published by J.A. Wollam Co., Inc.).
35. B. Johs, J. Hale, N. J. Ianno, C. M. Herzinger, T. Tiwald and J. A. Woollam, Proc. SPIE 4449, 41 (2001).
36. G. E. Jellison and F. A. Modine, Appl. Phys. Lett. 69, 371 (1996).
37. D. E. Aspnes, Thin Solid Films 89, 249 (1982).
38. D. E. Aspnes, in Handbook of Optical Constants of Solids, edited by, E. D. Palik, (Academic, Orlando, 1985), Vol. 1, pp. 89-112.
39. M. J. Weber, Handbook of Optical Materials (CRC, Boca Raton, 2003).
40. Y. Z. Hu, D. J. Diehl, Q. Liu, C. Y. Zhao, and E. A. Irene, Appl. Phys. Lett. 66, 700 (1995).
41. R. W. Collins and B. Y. Yang, J. Vac. Sci. Technol. B 7, 1155 (1989).