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Volumn 27, Issue 3, 2002, Pages 212-216
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Issues in high-κ gate stack interfaces
a a a
a
NONE
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Author keywords
Gate stacks; High dielectric constant materials; High dielectrics; Interface reactions; Metal gates
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Indexed keywords
BONDING;
COMPOSITION;
DIELECTRIC MATERIALS;
ELECTRIC INSULATORS;
ELECTRONIC STRUCTURE;
FILM GROWTH;
GATES (TRANSISTOR);
PERMITTIVITY;
REACTION KINETICS;
SILICON;
THERMODYNAMIC PROPERTIES;
DIELECTRIC STACKS;
GATE ELECTRODES;
HIGH DIELECTRIC CONSTANT GATE STACK INTERFACES;
METALLIC GATES;
INTERFACES (MATERIALS);
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EID: 0036501118
PISSN: 08837694
EISSN: None
Source Type: Journal
DOI: 10.1557/mrs2002.73 Document Type: Article |
Times cited : (88)
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References (12)
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