Recent developments in spectroscopic ellipsometry for in situ applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4449, Issue , 2001, Pages 41-57

  Johs, Blaine ^a   Hale, Jeff ^c   Ianno, N J ^c   Herzinger, Craig M ^c   Tiwald, Tom ^c   Woollam, John A ^c  

^a J A WOOLLAM CO INC   (United States)

^b UNIVERSITY OF NEBRASKA LINCOLN   (United States)

^c NONE

Author keywords

Ellipsometry; In situ; Process control; Real time; Spectroscopy

Indexed keywords

BIREFRINGENCE; DISPLAY DEVICES; LIGHT POLARIZATION; OPTICAL COATINGS; PROCESS CONTROL; SPECTROSCOPIC ANALYSIS;

ROTATING COMPENSATOR; SPECTROSCOPIC ELLIPSOMETRY;

ELLIPSOMETRY;

EID: 0035760718     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.450108     Document Type: Article

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