Influence of process parameters on the structure and the properties of ZrO2 coatings deposited by reactive pulsed magnetron sputtering (PMS)

Thin Solid Films

Volumn 377, Issue 378, 2000, Pages 37-42

  Goedicke, Klaus ^a   Liebig, Jörn Steffen ^a   Zywitzki, Olaf ^a   Sahm, Hagen ^a  

^a Fraunhofer Institute for Electron Beam and Plasma Technology   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; ARGON; ATOMIC FORCE MICROSCOPY; CHEMICAL MODIFICATION; COMPRESSIVE STRESS; ELASTIC MODULI; MAGNETRON SPUTTERING; OXIDE SUPERCONDUCTORS; REFRACTIVE INDEX; SUBSTRATES; X RAY DIFFRACTION ANALYSIS; ZIRCONIA;

NANOINDENTATION METHODS; REACTIVE PULSED MAGNETRON SPUTTERING;

SUPERCONDUCTING FILMS;

EID: 4243590634     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01381-X     Document Type: Article

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