Maskless lithography

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 381-392

  Pease, R Fabian ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

Electron beam; Lithography; Maskless; Optical lithography

Indexed keywords

CHARGED PARTICLES; EDGE DETECTION; ELECTRON BEAMS; LIGHT MODULATION; LITHOGRAPHY; OPTICS; PROJECTION SYSTEMS;

CHARGED PARTICLE MASKLESS LITHOGRAPHY (CPML); MASKLESS; MINIMUM FEATURE SIZE (MFS); PHOTOMASKS;

MASKS;

EID: 14944355999     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2005.01.009     Document Type: Conference Paper

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