Defect-tolerant and directional wet-etch systems for using monolayers as resists

Langmuir

Volumn 18, Issue 6, 2002, Pages 2374-2377

  Geissler, Matthias ^a   Schmid, Heinz ^a   Bietsch, Alexander ^a   Michel, Bruno ^a   Delamarche, Emmanuel ^a  

^a IBM RESEARCH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

RESISTS;

ADDITIVES; ADSORPTION; ETCHING; SPIN COATING; ULTRATHIN FILMS; WETTING;

MONOLAYERS;

EID: 0037133845     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0155909     Document Type: Article

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